B/Si multilayers for soft X-ray and extreme ultraviolet optics

Marie-Françoise Ravet (1) , Françoise Bridou (1) , A. Raynal (1) , Bruno Pardo (1) , Jean-Pierre Chauvineau (1) , Jean-Michel André (2)

1 Laboratoire Charles Fabry de l'Institut d'Optique / Scop
2 LCPMR - Laboratoire de Chimie Physique - Matière et Rayonnement

With the development of x-ray sources, high reflectivity and selectivity multilayers for optics are becoming a field of interest for the spectral region of 13-40 nm. In this article, it is shown from theoretical computations that multilayers made of two light materials such as B/Si can be used for these applications. Such multilayers were deposited by electron evaporation. Their physical properties were studied by x-ray reflectometry analyses at two wavelengths: 0.154 and 12.6 nm. The results show that the multilayers are made of dense and pure materials and that the interfacial layer thickness ranges from 0.3 to 0.7 nm.

Domaines: Optique [physics.optics]

Marie-Françoise Ravet, Françoise Bridou, A. Raynal, Bruno Pardo, Jean-Pierre Chauvineau, et al.. B/Si multilayers for soft X-ray and extreme ultraviolet optics. Journal of Applied Physics, 2001, 89 (2), pp.1145-1150. ⟨10.1063/1.1322590#⟩. ⟨hal-00872668⟩