B/Si multilayers for soft X-ray and extreme ultraviolet optics

Abstract : With the development of x-ray sources, high reflectivity and selectivity multilayers for optics are becoming a field of interest for the spectral region of 13-40 nm. In this article, it is shown from theoretical computations that multilayers made of two light materials such as B/Si can be used for these applications. Such multilayers were deposited by electron evaporation. Their physical properties were studied by x-ray reflectometry analyses at two wavelengths: 0.154 and 12.6 nm. The results show that the multilayers are made of dense and pure materials and that the interfacial layer thickness ranges from 0.3 to 0.7 nm.