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Journal articles
B/Si multilayers for soft X-ray and extreme ultraviolet optics
Abstract : With the development of x-ray sources, high reflectivity and selectivity multilayers for optics are becoming a field of interest for the spectral region of 13-40 nm. In this article, it is shown from theoretical computations that multilayers made of two light materials such as B/Si can be used for these applications. Such multilayers were deposited by electron evaporation. Their physical properties were studied by x-ray reflectometry analyses at two wavelengths: 0.154 and 12.6 nm. The results show that the multilayers are made of dense and pure materials and that the interfacial layer thickness ranges from 0.3 to 0.7 nm.
Cited literature [2 references]
https://hal-iogs.archives-ouvertes.fr/hal-00872668
Contributor : Fatima Pereira <>
Submitted on : Monday, October 14, 2013 - 11:22:49 AM
Last modification on : Wednesday, September 16, 2020 - 5:43:40 PM
Long-term archiving on: : Friday, April 7, 2017 - 10:18:17 AM
Contributor : Fatima Pereira <>
Submitted on : Monday, October 14, 2013 - 11:22:49 AM
Last modification on : Wednesday, September 16, 2020 - 5:43:40 PM
Long-term archiving on: : Friday, April 7, 2017 - 10:18:17 AM
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11_00200.pdf
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