X-ray multilayer monochromator with enhanced performance

Jean-Michel André (1) , Rabah Benbalagh (1) , Robert Barchewitz (1) , Marie-Françoise Ravet (2) , Alain Raynal (2) , Franck Delmotte (2) , Françoise Bridou (2) , Gwénäelle Julié (3) , A. Bosseboeuf (3) , René Laval (3) , Gérard Souillet (4) , Christian Remond (4) , Michel Fialin (5)

1 LCPMR - Laboratoire de Chimie Physique - Matière et Rayonnement
2 Laboratoire Charles Fabry de l'Institut d'Optique / Scop
3 IEF - Institut d'électronique fondamentale
4 DAM/DIF - DAM Île-de-France
5 LURE - Laboratoire pour l'utilisation du rayonnement électromagnétique

An x-ray multilayer monochromator with improved resolution and a low specular background is presented. The monochromator consists of a lamellar multilayer amplitude grating with appropriate parameters used at the zeroth diffraction order. The device is fabricated by means of combining deposition of thin films on a nanometer scale, UV lithography, and reactive ion etching. The performance of this new monochromator at photon energies near 1500 eV is shown.

Domaines: Optique [physics.optics]

Jean-Michel André, Rabah Benbalagh, Robert Barchewitz, Marie-Françoise Ravet, Alain Raynal, et al.. X-ray multilayer monochromator with enhanced performance. Applied optics, 2002, 41 (1), pp.239-244. ⟨10.1364/AO.41.000239⟩. ⟨hal-00874234⟩