X-ray multilayer monochromator with enhanced performance

Abstract : An x-ray multilayer monochromator with improved resolution and a low specular background is presented. The monochromator consists of a lamellar multilayer amplitude grating with appropriate parameters used at the zeroth diffraction order. The device is fabricated by means of combining deposition of thin films on a nanometer scale, UV lithography, and reactive ion etching. The performance of this new monochromator at photon energies near 1500 eV is shown.
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Jean-Michel André, Rabah Benbalagh, Robert Barchewitz, Marie-Françoise Ravet, Alain Raynal, et al.. X-ray multilayer monochromator with enhanced performance. Applied optics, Optical Society of America, 2002, 41 (1), pp.239-244. ⟨10.1364/AO.41.000239⟩. ⟨hal-00874234⟩

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