Design, conception, and metrology of EUV mirrors for aggressive environments - Institut d'Optique Graduate School Accéder directement au contenu
Proceedings/Recueil Des Communications Année : 2007

Design, conception, and metrology of EUV mirrors for aggressive environments

Résumé

We introduce a compact array fluorescence sensor principle that takes advantage of the long luminescence lifetimes of upconversion nanoparticles (UCNPs) to deploy a filter-free, optics-less contact geometry, advantageous for modern biochemical assays of biomolecules, pollutants or cells. Based on technologically mature CMOS chips for ∼10 kHz technical/scientific imaging, we propose a contact geometry between assayed molecules or cells and a CMOS chip that makes use of only a faceplate or direct contact, employing time-window management to reject the 975 nm excitation light of highly efficient UCNPs. The chip surface is intended to implement, in future devices, a resonant waveguide grating (RWG) to enhance excitation efficiency, aiming at the improvement of upconversion luminescence emission intensity of UCNP deposited atop of such an RWG structure. Based on mock-up experiments that assess the actual chip rejection performance, we bracket the photometric figures of merit of such a promising chip principle and predict a limit of detection around 10-100 nanoparticles.
Fichier non déposé

Dates et versions

hal-04523071 , version 1 (27-03-2024)

Identifiants

Citer

Christophe Hecquet, Marie-Françoise Ravet-Krill, Franck Delmotte, Arnaud Jérôme, Aurélie Hardouin, et al.. Design, conception, and metrology of EUV mirrors for aggressive environments. International Congress on Optics and Optoelectronics, SPIE proceedings, 6586, pp.65860X, 2007, ⟨10.1117/12.723483⟩. ⟨hal-04523071⟩
5 Consultations
0 Téléchargements

Altmetric

Partager

Gmail Mastodon Facebook X LinkedIn More