Ion beam milling fabrication of a small off-axis ellipsoidal mirror, diffraction limited to 1 μm resolution at 14 nm

Raymond Mercier 1 Michel Mullot 1 Michel Lamare 1 Gérard Tissot 1
1 Laboratoire Charles Fabry de l'Institut d'Optique / Scop
LCFIO - Laboratoire Charles Fabry de l'Institut d'Optique
Abstract : One interest of extreme ultraviolet wavelengths is their potentially high optical resolution. Such optics require high precision, low roughness surfaces onto which will be deposed adequate multilayers giving near-normal incidence reflection. For a spatially resolved interferometer, we have manufactured and tested with a reasonable degree of confidence an 8×8 mm off-axis ellipsoidal mirror, below the diffraction limit for a 14 nm wavelength. The ion beammilling technique employed for the fabrication allows to preserve the low roughness of the initial spherical substrate, and although we only achieved a 0.4 nm root-mean-square roughness, better could easily be done. At these precisions, testing is as important and as difficult as the figuring itself. The resulting mirror combines high theoretical resolution (1 μm) over a large object field (∼1 mm in diameter).
Type de document :
Article dans une revue
Review of Scientific Instruments, American Institute of Physics, 2001, 72 (2), pp.1559-1564. 〈10.1063/1.1340562〉
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Contributeur : Fatima Pereira <>
Soumis le : mardi 19 novembre 2013 - 16:35:42
Dernière modification le : jeudi 11 janvier 2018 - 06:26:11

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Raymond Mercier, Michel Mullot, Michel Lamare, Gérard Tissot. Ion beam milling fabrication of a small off-axis ellipsoidal mirror, diffraction limited to 1 μm resolution at 14 nm. Review of Scientific Instruments, American Institute of Physics, 2001, 72 (2), pp.1559-1564. 〈10.1063/1.1340562〉. 〈hal-00906408〉

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