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EUV near normal incidence collector development at SAGEM

Renaud Mercier-Ythier 1 Xavier Bozec 1 Roland Geyl 1 André Rinchet 1 Christophe Hecquet 2 Marie-Françoise Ravet-Krill 2 Franck Delmotte 2 Benoit Sassolas 3 Raffaele Flamino 3 Jean-Marie Mackowski 3 Christophe Michel 3 Jean-Luc Montorio 3 Nazario Morgado 3 Laurent Pinard 3 Élodie Romeo 3 
1 SAGEM Défense Sécurité [Massy]
2 Laboratoire Charles Fabry de l'Institut d'Optique / Scop
LCFIO - Laboratoire Charles Fabry de l'Institut d'Optique
3 LMA - Laboratoire des matériaux avancés
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https://hal-iogs.archives-ouvertes.fr/hal-00814125
Contributor : Sébastien de Rossi Connect in order to contact the contributor
Submitted on : Tuesday, April 16, 2013 - 3:36:19 PM
Last modification on : Sunday, June 26, 2022 - 11:58:36 AM

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IN2P3 | IOGS | LMA | CNRS | UNIV-LYON1 | PARISTECH | LCF_SCOP | UDL

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Renaud Mercier-Ythier, Xavier Bozec, Roland Geyl, André Rinchet, Christophe Hecquet, et al.. EUV near normal incidence collector development at SAGEM. Emerging lithographic technologies XII, Feb 2008, San José, United States. pp.692135, ⟨10.1117/12.787620⟩. ⟨hal-00814125⟩

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