Large area nanopatterning by combined Anodic Aluminum Oxide and soft UV-NIL technologies for applications in biology - Archive ouverte HAL Access content directly
Journal Articles Microelectronic Engineering Year : 2011

Large area nanopatterning by combined Anodic Aluminum Oxide and soft UV-NIL technologies for applications in biology

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Abstract

Combining the nanoporous anodic aluminum oxide (AAO) technique with soft lithography constitutes a highly reproducible and quick method for large-area nanopatterning, with increasing potential for applications in biology. The AAO templates were used as master-molds to fabricate large areas (several square centimeters) of nanostructured and ordered tapered PDMS-bumps. The master-molds were filled using hexane-diluted PDMS of reduced viscosity compared to standard one. Viscosity evolution study for different current agent and hexane concentrations was achieved. The as-obtained stamps served subsequently to create large-area highly ordered nanostructured silicon substrates using UV assisted Nanoimprint Lithography (UV–NIL).
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Dates and versions

hal-00627203 , version 1 (28-09-2011)

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Frédéric Hamouda, Houda Sahaf, Sylvain Held, Grégory Barbillon, Philippe Gogol, et al.. Large area nanopatterning by combined Anodic Aluminum Oxide and soft UV-NIL technologies for applications in biology. Microelectronic Engineering, 2011, 88 (8), pp.2444-2446. ⟨10.1016/j.mee.2011.02.013⟩. ⟨hal-00627203⟩
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