Large area nanopatterning by combined Anodic Aluminum Oxide and soft UV-NIL technologies for applications in biology

Frédéric Hamouda (1) , Houda Sahaf (2) , Sylvain Held (1) , Grégory Barbillon (3) , Philippe Gogol (1) , Eric Moyen (2) , Abdelhanin Aassime (1) , Julien Moreau (3) , Michael Canva (3) , Jean-Michel Lourtioz (1) , Margrit Hanbücken (2) , Bernard Bartenlian (1)

1 IEF - Institut d'électronique fondamentale
2 CINaM - Centre Interdisciplinaire de Nanoscience de Marseille
3 Laboratoire Charles Fabry de l'Institut d'Optique / Macsybio - bio

Combining the nanoporous anodic aluminum oxide (AAO) technique with soft lithography constitutes a highly reproducible and quick method for large-area nanopatterning, with increasing potential for applications in biology. The AAO templates were used as master-molds to fabricate large areas (several square centimeters) of nanostructured and ordered tapered PDMS-bumps. The master-molds were filled using hexane-diluted PDMS of reduced viscosity compared to standard one. Viscosity evolution study for different current agent and hexane concentrations was achieved. The as-obtained stamps served subsequently to create large-area highly ordered nanostructured silicon substrates using UV assisted Nanoimprint Lithography (UV–NIL).

Mots clés: PDMS stamp; Soft UV–NIL; Nanoporous alumina; Viscosity; Hexane

Domaines: Optique [physics.optics]

Frédéric Hamouda, Houda Sahaf, Sylvain Held, Grégory Barbillon, Philippe Gogol, et al.. Large area nanopatterning by combined Anodic Aluminum Oxide and soft UV-NIL technologies for applications in biology. Microelectronic Engineering, 2011, 88 (8), pp.2444-2446. ⟨10.1016/j.mee.2011.02.013⟩. ⟨hal-00627203⟩