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Interface characteristics of Mo/Si and B4C/Mo/Si multilayers using non-destructive X-ray techniques

Hélène Maury 1 Philippe Jonnard 1 Jean-Michel André 1 Julien Gautier 2 Françoise Bridou 2 Franck Delmotte 2 Marie-Françoise Ravet-Krill 2 
1 LCPMR - Laboratoire de Chimie Physique - Matière et Rayonnement
2 Laboratoire Charles Fabry de l'Institut d'Optique / Scop
LCFIO - Laboratoire Charles Fabry de l'Institut d'Optique
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https://hal-iogs.archives-ouvertes.fr/hal-00575880
Contributor : Sébastien de Rossi Connect in order to contact the contributor
Submitted on : Friday, March 11, 2011 - 12:18:06 PM
Last modification on : Sunday, June 26, 2022 - 11:53:32 AM

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  • HAL Id : hal-00575880, version 1

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IOGS | UPMC | CNRS | PARISTECH | LCF_SCOP | LCPMR | INC-CNRS | SORBONNE-UNIVERSITE | SU-SCIENCES

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Hélène Maury, Philippe Jonnard, Jean-Michel André, Julien Gautier, Françoise Bridou, et al.. Interface characteristics of Mo/Si and B4C/Mo/Si multilayers using non-destructive X-ray techniques. Surface Science, Elsevier, 2007, 601 (11), pp.2315-2322. ⟨hal-00575880⟩

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