Experimental determination of optical constants of MgF2 and AlF3 thin films in the vacuum ultra-violet wavelength region (60–124 nm), and its application to optical designs
Résumé
The investigation of some solar radiations of interest for astrophysicists requires optics in the 80–130 nm vacuum ultra-violet spectral range (VUV). In this domain, where both transmittance and reflectance of most materials are very low, the measurement of optical constants is specifically difficult, and optical data are consequently often either inexistent or uncertain. Reliable modelling of optical components for VUV, like polarizing multi-layered mirrors, necessitates prior measurement of complex indices of the thin films involved in the coating. Fluorides like MgF2 or AlF3 are among the rare materials capable to contribute to multi-layer mirrors in the VUV. We have determined optical constants of thin films of these two materials by using a two media reflectance method at normal incidence and a graphical determination particularly suited to this VUV region, which we presented in a previous paper. Optical constants are determined in the range 60–124 nm with 2 nm step, and are compared to existing data. On the basis of these measured indices, polarizing mirrors for k1 = 121.6 nm or k2 = 103.2 nm have been modelled and fabricated. Their reflectance measured versus incidence angle by using monochromatized synchrotron radiation at the above wavelengths is found in agreement with the calculated predictions.