Extreme ultraviolet lithography, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol.16, issue.6, pp.3142-3149, 1998. ,
DOI : 10.1116/1.590453
Thin-Film Optical Filters, pp.11-43, 1986. ,
DOI : 10.1887/0750306882
X-ray interactions: photoabsorption, scattering, transmission, and reflection at E 50 ?30, At. Data Nucl. Data Tables, vol.54, pp.0-1, 1993. ,
DOI : 10.1006/adnd.1993.1013
Phase correcting layers in EUV imaging systems for microlithography, pp.152-155, 1996. ,
Sub-nanometer figure error correction of an extreme ultraviolet multilayer mirror by its surface milling, Nucl. Instrum. Methods Phys. Res. A, pp.467-468, 2001. ,
Design of multilayer extreme-ultraviolet mirrors for enhanced reflectivity, Applied Optics, vol.39, issue.13, pp.2189-2197, 2000. ,
DOI : 10.1364/AO.39.002189
Improved theoretical reflectivities of extreme-ultraviolet mirrors, Emerging Lithographic Technologies IV Proc. SPIE, pp.412-419, 2000. ,
Reflectance enhancement in the extreme ultraviolet and soft x rays by means of multilayers with more than two materials, Journal of the Optical Society of America A, vol.19, issue.2, pp.391-397, 2002. ,
DOI : 10.1364/JOSAA.19.000391
Optical Filter Design and Analysis Wiley Interscience, p.285, 1999. ,
The influence of multilayers on the optical performance of extreme ultraviolet projection systems, International Optical Design Conference 2002, pp.149-157, 2002. ,
DOI : 10.1117/12.486478
Difference in the phase shifts due to the two MLs deposited on the base ML. A -rad phase difference in the wave front is achieved after 12 periods ,