Maximum reflectance of multilayer dielectric mirrors in the presence of slight absorption, Journal of the Optical Society of America, vol.70, issue.5, pp.523-534, 1980. ,
DOI : 10.1364/JOSA.70.000523
Design of multilayer extreme-ultraviolet mirrors for enhanced reflectivity, Applied Optics, vol.39, issue.13, pp.2189-2197, 2000. ,
DOI : 10.1364/AO.39.002189
Reflectance enhancement with sub-quarterwave multilayers of highly absorbing materials, Journal of the Optical Society of America A, vol.18, issue.6, pp.1406-1414, 2001. ,
DOI : 10.1364/JOSAA.18.001406
New layer-by-layer multilayer design method, Journal of the Optical Society of America A, vol.19, issue.2, pp.385-390, 2002. ,
DOI : 10.1364/JOSAA.19.000385
Reflectance enhancement in the extreme ultraviolet and soft x rays by means of multilayers with more than two materials, Journal of the Optical Society of America A, vol.19, issue.2, pp.391-397, 2002. ,
DOI : 10.1364/JOSAA.19.000391
Three materials soft x-ray mirrors: theory and application, Advanced X-Ray/EUV Radiation Sources and Applications Proc. SPIE 1345, pp.198-212, 1990. ,
DOI : 10.1117/12.23315
Ion beam deposited MoSi multilayers for EUV imaging applications in astrophysics, Advances in Optical Thin Films Proc. SPIE, pp.99-108, 2004. ,
EUV multilayers for solar physics, Optics for EUV, X-Ray, and Gamma-Ray Astronomy, pp.1-11, 2004. ,
DOI : 10.1117/12.506175
D??p??t et calibration de multicouches pour l'optique XUV dans la gamme 10???30??nm, Journal de Physique IV (Proceedings), vol.108, pp.255-258, 2003. ,
DOI : 10.1051/jp4:20030638
Measured and calculated reflectivities of a B 4 CMoSi three-component multilayer at 10 deg in S polarization. Parameters of the simulated curve are given in the text ,
Silicon/silicon oxide and silicon/silicon nitride multilayers for extreme ultraviolet, Optical Engineering, vol.30, issue.8, pp.1049-1060, 1991. ,
DOI : 10.1117/12.55920
X-Ray Interactions: Photoabsorption, Scattering, Transmission, and Reflection at E = 50-30,000 eV, Z = 1-92, Atomic Data and Nuclear Data Tables, vol.54, issue.2, pp.181-342, 1993. ,
DOI : 10.1006/adnd.1993.1013
Absolute photoabsorption measurements of molybdenum in the range 60???930 eV for optical constant determination, Applied Optics, vol.37, issue.10, pp.1713-1719, 1998. ,
DOI : 10.1364/AO.37.001713
Reflectance measurements on clean surfaces for the determination of optical constants of silicon in the extreme ultraviolet???soft-x-ray region, Applied Optics, vol.36, issue.22, pp.5499-5507, 1997. ,
DOI : 10.1364/AO.36.005499
Multilayer reflective coatings for extremeultraviolet lithography, Emerging Lithographic Technologies II, Y. Vladimirsky Proc. SPIE 3331, pp.42-50, 1998. ,
DOI : 10.1117/12.309600
URL : http://digital.library.unt.edu/ark:/67531/metadc685508/m2/1/high_res_d/310916.pdf
Automatic characterization of layers stacks from reflectivity measurements. Application to the study of the validity conditions of grazing X-rays reflectometry, Journal of Optics, vol.21, issue.4, pp.183-191, 1990. ,
DOI : 10.1088/0150-536X/21/4/005
The new Bear beamline: a short presentation, p.47, 2003. ,