T. W. Barbee-jr, S. Mrowka, and M. C. Hettrick, Molybdenum-silicon multilayer mirrors for the extreme ultraviolet, Applied Optics, vol.24, issue.6, pp.883-886, 1985.
DOI : 10.1364/AO.24.000883

J. Gautier, F. Delmotte, M. Rouillay, F. Bridou, M. F. Ravet et al., Study of normal incidence of three-component multilayer mirrors in the range 20???40 nm, Applied Optics, vol.44, issue.3, pp.384-390, 2005.
DOI : 10.1364/AO.44.000384

URL : https://hal.archives-ouvertes.fr/hal-00575801

R. M. Fechtchenko, A. V. Vinogradova, and D. L. Voronov, Optical properties of sliced multilayer gratings, Optics Communications, vol.210, issue.3-6, pp.179-186, 2002.
DOI : 10.1016/S0030-4018(02)01769-8

M. D. Levinson, N. S. Viswanathan, and R. A. Simpson, Improving resolution in photolithography with a phase-shifting mask, IEEE Transactions on Electron Devices, vol.29, issue.12, p.29, 1982.
DOI : 10.1109/T-ED.1982.21037

T. Ito and S. Okazaki, Pushing the limits of lithography, Nature, vol.406, issue.6799, pp.1027-1031, 2000.
DOI : 10.1038/35023233

J. Svatos, D. Joyeux, D. Phalippou, and F. Polack, Soft-x-ray interferometer for measuring the refractive index of materials, Optics Letters, vol.18, issue.16, pp.1367-1369, 1993.
DOI : 10.1364/OL.18.001367

C. Chang, E. Anderson, P. Naulleau, E. Gullikson, K. Goldberg et al., Direct measurement of index of refraction in the extreme-ultraviolet wavelength region with a novel interferometer, Optics Letters, vol.27, issue.12, pp.1028-1030, 2002.
DOI : 10.1364/OL.27.001028

L. B. Da-silva, T. W. Barbee-jr, R. Cauble, P. Celliers, D. Ciarlo et al., Sectional scheme of the reference zone (left) and the PSM zone (right). The optical rays describe the reflection of the EUV illumination on the effective planes of the stacks

D. Ress, J. E. Trebes, A. S. Wan, and F. Weber, Electron density measurements of high density plasmas using soft x-ray laser interferometry, Phys. Rev. Lett, vol.74, pp.3991-3994, 1995.

R. F. Smith, J. Dunn, J. R. Nilsen, V. N. Hunter, J. J. Shlyaptsev et al., Refraction effects on x-ray and ultraviolet interferometric probing of laser-produced plasmas, Journal of the Optical Society of America B, vol.20, issue.1, pp.254-259, 2003.
DOI : 10.1364/JOSAB.20.000254

P. P. Naulleau, K. A. Goldberg, S. H. Lee, C. Chang, D. Attwood et al., Extreme-ultraviolet phase-shifting point-diffraction interferometer: a wave-front metrology tool with subangstrom reference-wave accuracy, Applied Optics, vol.38, issue.35, pp.7252-7263, 1999.
DOI : 10.1364/AO.38.007252

M. Richard, D. Constancias, D. Joyeux, J. Y. Robic, S. De-rossi et al., EUV phase shift masks samples at wavelength phase shift measurements on dedicated samples, The Proceedings of the 5th International EUVL Symposium, 2006.

P. P. Naulleau and K. A. Goldberg, Dual-domain point diffraction interferometer, Applied Optics, vol.38, issue.16, pp.3523-3533, 1999.
DOI : 10.1364/AO.38.003523

J. J. Rocca, C. H. Moreno, M. C. Marconi, and K. Kanizay, Soft-x-ray laser interferometry of a plasma with a tabletop laser and a Lloyd's mirror, Optics Letters, vol.24, issue.6, pp.420-422, 1999.
DOI : 10.1364/OL.24.000420

L. B. Da-silva, T. W. Barbee-jr, R. Cauble, P. Celliers, D. Ciarlo et al., Extreme-ultraviolet interferometry at 155 nm using multilayer optics, Applied Optics, vol.34, issue.28, pp.6389-6392, 1995.
DOI : 10.1364/AO.34.006389

Y. Zhu, K. Sugisaki, M. Okada, K. Otaki, Z. Liu et al., Wavefront measurement interferometry at the operational wavelength of extreme-ultraviolet lithography, Applied Optics, vol.46, issue.27, pp.6783-6792, 2007.
DOI : 10.1364/AO.46.006783

F. Polack, D. Joyeux, J. Svatos, and D. Phalippou, Applications of wavefront division interferometers in soft x rays, Review of Scientific Instruments, vol.66, issue.2, pp.2180-2183, 1995.
DOI : 10.1063/1.1145698

M. Takeda, H. Ina, and S. Kobayashi, Fourier-transform method of fringe-pattern analysis for computer-based topography and interferometry, Journal of the Optical Society of America, vol.72, issue.1, p.156, 1982.
DOI : 10.1364/JOSA.72.000156

D. Huang, E. A. Swanson, C. P. Lin, J. S. Schuman, W. G. Stinson et al., Optical coherence tomography, Science, vol.254, issue.5035, pp.1178-1181, 1991.
DOI : 10.1126/science.1957169

B. Povazay, K. Bizheva, A. Unterhuber, B. Hermann, H. Sattmann et al., A p o l o n s k i Submicrometer axial resolution optical coherence tomography, Opt. Lett, issue.20, pp.27-1800, 2002.

D. L. Windt, XUV optical constants of single-crystal GaAs and sputtered C, Si, Cr_3C_2, Mo, and W, Applied Optics, vol.30, issue.1, pp.15-25, 1991.
DOI : 10.1364/AO.30.000015

R. Soufli and E. M. Gullikson, Reflectance measurements on clean surfaces for the determination of optical constants of silicon in the extreme ultraviolet???soft-x-ray region, Applied Optics, vol.36, issue.22, pp.5499-5507, 1997.
DOI : 10.1364/AO.36.005499

R. Soufli and E. M. Gullikson, Absolute photoabsorption measurements of molybdenum in the range 60???930 eV for optical constant determination, Applied Optics, vol.37, issue.10, pp.1713-1719, 1998.
DOI : 10.1364/AO.37.001713

C. Tarrio, R. N. Watts, T. B. Lucatorto, J. M. Slaughter, and C. M. Falco, Optical constants of in situ-deposited films of important extreme-ultraviolet multilayer mirror materials, Applied Optics, vol.37, issue.19, pp.4100-4104, 1998.
DOI : 10.1364/AO.37.004100