Resonant grating pulse compression element with 99% flat top efficiency for high average power femtosecond laser machining

M. Flury (1) , N. Lyndin (1) , R. Fechner (2) , A. Schindler (2) , S. Tonchev (1) , M. Spajer (3) , Y. Ouerdane (1) , N. Destouches (1) , D. Pietroy (1) , S. Reynaud (1) , O. Parriaux (1)

1 LHC - Laboratoire Hubert Curien
2 IOM - Institute of Surface Modification
3 FEMTO-ST - Franche-Comté Électronique Mécanique, Thermique et Optique - Sciences et Technologies (UMR 6174)

Top hat diffraction efficiency in an all-dielectric SiO2/HfO2grating femtosecond pulse compression grating is demonstrated with a close to 100% flat top over more than 20 nm around 800 nm wavelength. New perspectives are open for high average power femtosecond laser machining

Mots clés: Dielectric materials; Silicon oxides; Binary compounds; fs range; Diffraction efficiency; Nonlinear optics; Pulsed lasers; Laser beam machining; Optical pulse compression; pulse compression; gratings; multilayers

Domaines: Optique / photonique

M. Flury, N. Lyndin, R. Fechner, A. Schindler, S. Tonchev, et al.. Resonant grating pulse compression element with 99% flat top efficiency for high average power femtosecond laser machining. SPIE Photonics Europe Photon management. Conference N° 2, Apr 2006, Strasbourg, France. pp.61871I.1-61871I.6, ⟨10.1117/12.668374⟩. ⟨hal-00369185⟩